Recently, RTP-like processing has found applications in another rapidly growing field �" solar cell fabrication. RTP-like processing, in which an increase in the temperature of the semiconductor sample is produced by the absorption of the optical flux, is now used for a host of solar cell fabrication steps, ncluding phosphorus diffusion for N/P junction formation and impurity gettering, hydrogen diffusion for impurity and defect passivation, and formation of screen-printed contacts using Ag-ink for the front and Al-ink for back contacts, respectively. The demands on an RTP system for solar cell fabrication are quite different from those for traditional microelectronics applications. Here, the primary emphasis is on throughput and cost (cost of ownership). These major considerations have resulted in RTP systems being belt-type, IR systems, which use tungsten-halogen lamps to illuminate the wafers from one side. The need for low-cost equipment and high throughput (600 wafers/hr) has some ramifications for process uniformity, with concomitant implications for the device performance.

Articles on Rapid Thermal Processing for Solar Cell:


RAPID THERMAL PROCESSING IN SILICON: MICROELECTRONICS TO SOLAR CELLS
Rapid Thermal Processing of Silicon Solar Cells -Passivation and Diffusion
Solar Cells on EFG and String Ribbon Silicon by rapid thermal processing
Lamp-based Processing Technologies for Silicon Solar Cell Manufacturing
Boron Back Surface Field Using Spin-On Dopants by Rapid Thermal Processing
RAPID THERMAL PROCESSING OF HIGH EFFICIENCY N-TYPE SILICON SOLAR CELLS WITH AL BACK JUNCTION


Allwin21 is the exclusive licenced manufacture for AG Heatpulse 610. Allwin21 is manufacturing the AccuThermo AW-610,originally the AG Heatpulse 610.The AccuThermo AW-610 has innovative software and more advanced temperature control technologies.

New AccuThermo AW 610

New AccuThermo AW 810M

Allwin21 is the exclusive licenced manufacture for AG Heatpulse 610. Allwin21 is manufacturing the AccuThermo AW-610,originally the AG Heatpulse 610.The AccuThermo AW-610 has innovative software and more advanced temperature control technologies













AccuThermo AW 810M is a desktop rapid thermal processor which uses high-intensity, visible radiation to heat single wafer for short periods at precisely controlled temperatures. These capabilities, combined with the heating chamber's cold-wall design, superior heating uniformity advanced temperature control technology and AW 900 new software, provide significant advantages over conventional furnace processing and conventional RTP systems.


AccuThermo AW 810M’s key features include:

Advanced ERP Pyrometer for precise high temperature measurement
Add timer watch for the oven safety issue (the original has no safety interlock for the computer locks up, chamber would be burned if the computer locks up when process running).
The new software with power summary function to detect either lamp failure or sensor failure
Manual Operation
Use Sumpower as a parameter to control the uniformity of the wafer.
Closed-loop temperature control with pyrometer or thermocouple temperature sensing.
Precise time-temperature profiles tailored to suit specific process requirements.
High-intensity visible radiation heats wafers for short periods. Fast heating and cooling rates unobtainable in conventional technologies.
Consistent wafer-to-wafer process cycle repeatability.
Elimination of external contamination.
Small footprint and energy efficiency.
Software calibration and easy to be done.
More functions and I/O hardware “exposed” for easier maintenance and trouble shooting.
It is easy to edit recipe with GUI and graph display.
Save all process data on the computer hard disk.
A/D and D/A precision is 14 to 16 bits.
Detect in process and with color curve displayed on the screen.
Lamp damage detect in process.
Sensor status detect function.
On line help function
AccuThermo AW 810M RTA RTP is a versatile tool, which is useful for many applications:
• Ion Implant Activation
• Polysilicon Annealing
• Oxide Reflow
• Silicide Formation
• Contact Alloying
• Oxidation and Nitridation
• GaAs Processing
For a bibliography and reprints of technical journal articles regarding these AccuTherm applications, contact the Allwin21 Corp. Marketing Communications Department.

AccuThermo AW 810M RTA RTP performance specification:

Recommended Steady-State Temperature Range: 100-1250° C.
Steady-State Temperature Stability: ± 1° C.
Temperature Monitoring Mechanisms: Extended Range Pyrometer (ERP),used for process temperatures from 600°C to 1250°C or a thermocouple, used for process temperatures below 800° C.
Heating Rate: 1-200° C per second, user-controllable, 10°C to 120°C for wafer, Programmable.
Cooling Rate: Temperature dependent; max 150° C per second.
Maximum Non-uniformity:
Radiant Flux: ±0.25%
Sheet resistivity(Post-anneal sheet resistivity measured on a 150mm wafer annealed at 1100° C for 10 seconds. R&D models optimized for slip control):
<2% (Dose Monitoring Units)
<1.35% (R&D Units)
Implant: As 1E16 50 KeV with implant uniformity 0.3%

Steady state process time 0 to 30000 sec programmable
Wafer Sizes for the AccuTherm AW 810M: 4", 5" ,6"and 8"
Process Gases: The AccuTherm AW 810M system delivers one non-corrosive process gas with one MFC. Up to four MFC is optional.
AccuThermo AW 810M specifications above may change as different models are introduced or as design enhancements are implemented.

Allwin21 is the exclusive licenced manufacture for AG Heatpulse 610. Allwin21 is manufacturing the AccuThermo AW-610,originally the AG Heatpulse 610.The AccuThermo AW-610 has innovative software and more advanced temperature control technologies

AccuThermo AW 610 is a desktop rapid thermal processor which uses high-intensity, visible radiation to heat single wafer for short periods at precisely controlled temperatures. These capabilities, combined with the heating chamber's cold-wall design, superior heating uniformity advanced temperature control technology and AW 900 new software, provide significant advantages over conventional furnace processing and conventional RTP systems.



AccuThermo AW 610’s key features include:

Advanced ERP Pyrometer for precise high temperature measurement
Add timer watch for the oven safety issue (the original has no safety interlock for the computer locks up, chamber would be burned if the computer locks up when process running).
The new software with power summary function to detect either lamp failure or sensor failure
Manual Operation
Use Sumpower as a parameter to control the uniformity of the wafer.
Closed-loop temperature control with pyrometer or thermocouple temperature sensing.
Precise time-temperature profiles tailored to suit specific process requirements.
High-intensity visible radiation heats wafers for short periods. Fast heating and cooling rates unobtainable in conventional technologies.
Consistent wafer-to-wafer process cycle repeatability.
Elimination of external contamination.
Small footprint and energy efficiency.
Software calibration and easy to be done.
More functions and I/O hardware “exposed” for easier maintenance and trouble shooting.
It is easy to edit recipe with GUI and graph display.
Save all process data on the computer hard disk.
A/D and D/A precision is 14 to 16 bits.
Detect in process and with color curve displayed on the screen.
Lamp damage detect in process.
Sensor status detect function.
On line help function
AccuThermo AW 610 RTA RTP is a versatile tool, which is useful for many applications:
• Ion Implant Activation
• Polysilicon Annealing
• Oxide Reflow
• Silicide Formation
• Contact Alloying
• Oxidation and Nitridation
• GaAs Processing
For a bibliography and reprints of technical journal articles regarding these AccuTherm applications, contact the Allwin21 Corp. Marketing Communications Department.

AccuThermo AW 610 RTA RTP performance specification:

Recommended Steady-State Temperature Range: 100-1250° C.
Steady-State Temperature Stability: ± 1° C.
Temperature Monitoring Mechanisms: Extended Range Pyrometer (ERP),used for process temperatures from 600°C to 1250°C or a thermocouple, used for process temperatures below 800° C.
Heating Rate: 1-200° C per second, user-controllable, 10°C to 120°C for wafer, Programmable.
Cooling Rate: Temperature dependent; max 150° C per second.
Maximum Non-uniformity:
Radiant Flux: ±0.25%
Sheet resistivity(Post-anneal sheet resistivity measured on a 150mm wafer annealed at 1100° C for 10 seconds. R&D models optimized for slip control):
<2% (Dose Monitoring Units)
<1.35% (R&D Units)
Implant: As 1E16 50 KeV with implant uniformity 0.3%

Steady state process time 0 to 30000 sec programmable
Wafer Sizes for the AccuTherm AW 610: 2", 3", 4", 5" and 6".
Process Gases: The AccuTherm AW 610 system delivers one non-corrosive process gas with one MFC. Up to four MFC is optional.
AccuThermo AW 610 specifications above may change as different models are introduced or as design enhancements are implemented.

Refurbished AG Heatpulse 8108

Manufacture:AG Associates.

Refurbished by:Allwin21 Corp

Heatpulse is a Registered Trademark of AG Associates.AG Heatpulse 8108 Series are single-wafer, cassette-to-cassette rapid thermal processors, capable of processing in inert or corrosive ambient. The unit is built for the production environment. AG8108 is a rapid thermal processor which uses high-intensity, visible radiation to heat single wafer for short periods at precisely controlled temperatures.






High-intensity visible radiation heats wafers for short periods. Fast heating and cooling rates unobtainable in conventional technologies.
Consistent wafer-to-wafer process cycle repeatability.
Elimination of external contamination.
Small footprint and energy efficiency
Wafer Size 4”, 5”, 6”, 8”
Robot control ability. (Equip Tech. robot with one arm)
Single Wafer Process.
Gold coated aluminum chamber with water cooling
Radiation heating lamp module
6-gas channel with 4 MFCs
Cassette to cassette wafer handling
Multiple cycle processing capability
Steady Temp Range: 600°C to 1250°C for pyrometer sensor, 100°C to 600°C for Thermocouple.
Steady state process time 0 to 30000 sec programmable.
Temp Ramp-up Speed: 10°C to 120°C for wafer. Programmable
Ramp down speed 10°C - 150°C for wafer
Robot wafer cycling: 80 Wafers/Hr.
AG Heatpulse 8108 RTA RTP is a versatile tool, which is useful for many applications:
• Ion Implant Activation
• Polysilicon Annealing
• Oxide Reflow
• Silicide Formation
• Contact Alloying
• Oxidation and Nitridation
• GaAs Processing



______________________________________________________________

Allwin21 Corp. can also provide Allwin21 Corp proprietary AW Control Software and Superior Temperature Control Technology to upgrade the refurbished AG Heatpulse 8108 which provides the following significant advantages



.

Add timer watch for the oven safety issue (the original has no safety interlock for the computer locks up, chamber would be burned if the computer locks up when process running).
The new software allows to do either 4",6” or 8” without changing hardware and robot teaching. It is good for the R&D or small production purpose. 2 or 3 susceptor towers can be put to handle 2 or 3 different wafer size for GaAs or InP wafers.
The new software with power summary function to detect either lamp failure or sensor failure
Precise Temperature/Time control, Temperature measuring precision ± 1°C.
New hardware includes: three interface cards with cable, new timer counter with watch dog, Pentium Computer with 17” LCD Monitor, standard keyboard and mouse.
Software calibration and easy to be done.
More functions and I/O hardware “exposed” for easier maintenance and trouble shooting.
It is easy to edit recipe with GUI and graph display.
Save all process data on the computer hard disk.
A/D and D/A precision is 14 to 16 bits.
Detect in process and with color curve displayed on the screen.
Robot teach is on the GUI and easy to do the procedure with new concept teaching method.
Lamp damage detect in process.
Sensor status detect function.
On line help function.

Refurbished Matrix 105

Manufacture:Matrix Integrated Systems


Refurbished by:Allwin21 Corp


Matrix is a Registered Trademark of Matrix Integrated Systems, Inc.Matrix 105 provides high throughput in a single wafer system capable of handling wide variety of substrates, including round, square and ranging from 3” up to 6”. By maintaining independent closed-loop system controls, the system optimizes vital device parameters.

Single Wafer, Multi-Step Processing
Closed-Loop Temperature Control
Pressure Control
Accurate, closed-loop pressure control with “butterfly-style” throttle valve and capacitance manometer
RF power: 100 to 500 watts
Timed cycles up to 4 hour each


Matrix105 Applications
Photoresist Stripping

High dose implant (As+, B+, P+)
Post-polysilicon etch
Post-metal etch
Post-oxide etch
Rework
Controlled Resist Removal

Post-develop descum (pre-etch)
Dry/wet process capability
Resist planarization
Uniformity capability (5% 1s)
GaAs wafer Stripping and Descum
Thin Film Head Resist Cleaning and Surface Treatment
MEMS (Micro Electro- Mechanical Systems) Up to 4 hour processes

Matrix 105 consists of the following major assemblies:

Main Console:
Process Model,
Operator interface Model,
Wafer Transport Module,
Elevator Module,
PC Control Module.

Power Supply Console:
RF Generator,
DC Supply,
AC Distribution,
Gas Distribution panel,
Temperature/Pressure Control Module.

Vacuum Pump (optional):


Vacuum Hose and Connector, Ballast Assembly.

______________________________________________________________

Allwin21 Corp. can also provide advanced Equip Robot transfer wafer technology , AW Control Software and Superior Temperature Control Technology to upgrade the refurbished Matrix 105 which provides the following significant advantages.

New hardware includes: New control Board with cable, new timer counter with watch dog, Pentium Computer with 17” LCD Monitor, standard keyboard and mouse.
Software calibration and easy to be done.
More functions and I/O hardware “exposed” for easier maintenance and trouble shooting.
It is easy to edit recipe with GUI and graph display.
Save all process data on the computer hard disk.
A/D and D/A precision is 14 to 16 bits.
Detect in process and with color curve displayed on the screen.
Robot teach is on the GUI and easy to do the procedure with new concept teaching method.
Software watch dog to eliminate machine damage duo to the computer locks up or freeze.
Sensor status detect function.
On line help function